Illustrative schematic geometry — not tapeout GDS/DEF. Procedural education model.
Ace-Seek · VLSI Learning Lab 3D Silicon Stack
Learning Portal
Die Area: 553.84 × 552.16 µm
StdCells: 11,126 Cells
Macros & Halos: 2 Macros
Taps / Caps / Fillers: 56 Caps · 184 Taps · 72 Decaps · 820 Fillers
PDN Grid: Dual Rings + 14 Straps
Packaging / I/O: 64 Wirebonds · L≈1.2nH
Z-Spread: 2.2x Exploded
Render FPS: 60.0 FPS
Select ⚡ RC Path to open Elmore HUD
⚡ 3D Interconnect Extraction:
Driver: sky130_fd_sc_hd__inv_2 (Rd=450Ω) → Load: sky130_fd_sc_hd__nand2_1 (Cin=2.4fF)
Manhattan Length: 34.2 µm Wire R: 24.5 Ω Wire C: 6.15 fF Vias: 4 cuts (27.6 Ω) Elmore τ: 6.42 ps t_pd (50%): 4.45 ps Slew (10→90%): 14.1 ps
🔬 Wafer Prep
Wafer Prep Master
Cause—
When (phase)—
Key params—
Pitfalls—
Interview hook—
Antenna Ratio = Metal Area (or perimeter) / Gate Oxide Area
📦 Wirebond Leadframe Beginner
L (typ)~1.2 nH loop Pitch~75–100 µm pad I/O dens.Low (perimeter) CostLow Best forMCUs, QFN/SOIC
Illustrative leadframe + Au wires. Package delay is R+L / SSO — not on-die Elmore RC.
💎 ~2nm GAA + BSPD Lowest advanced
DeviceGAA nanosheet BEOLCu + EUV / multi-pattern PowerBSPD / PowerVia class Key challengeFrontside track starvation + IR
Challenges
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Methods
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Educational schematic — not a foundry DRC deck.
Layer Visibility Matrix ▼
Exploded Z-Spread 2.2x
Substrate Thickness 15 µm
Silicon Substrate Overview
Coordinates:X: 276.9 µm, Y: 276.1 µm Selected Layer:Silicon Substrate (FEOL) Material:P-type Bulk Silicon (<100>) Sheet Resistance:10-20 Ω·cm bulk Design Rule:Deep N-Well isolation for analog blocks
FAB STEP 1 / 8 Silicon Substrate & Wells (FEOL)
P-type monocrystalline silicon bulk wafer. Shallow trench isolation (STI) etched with thermal oxide liner to isolate standard cells. Ion-implanted N-Wells and P-Wells form the active silicon foundation.